Rainer L. Pelzer
Technical Management at EV Group
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | January 23, 2006
Proc. SPIE. 6110, Micromachining Technology for Micro-Optics and Nano-Optics IV
KEYWORDS: Wafer-level optics, Nanotechnology, Optical components, Lithography, Ultraviolet radiation, Telecommunications, Nanoimprint lithography, Optical alignment, Semiconducting wafers, Nanolithography

PROCEEDINGS ARTICLE | February 23, 2005
Proc. SPIE. 5650, Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II
KEYWORDS: Lithography, Polymethylmethacrylate, Polymers, Glasses, Ultraviolet radiation, Silicon, Microelectronics, Nanoimprint lithography, Optical alignment, Semiconducting wafers

PROCEEDINGS ARTICLE | May 20, 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Nanotechnology, Lithography, Visible radiation, Nanostructuring, Polymers, Glasses, Manufacturing, Scanning electron microscopy, Nanoimprint lithography, Optical alignment

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