Dr. Rainer Pforr
at RP Consulting
SPIE Involvement:
Publications (31)

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 727422 (2009) https://doi.org/10.1117/12.814123
KEYWORDS: Signal attenuation, Photomasks, Semiconducting wafers, Critical dimension metrology, Scanners, Multilayers, Objectives, Deep ultraviolet, Lenses, Chemical elements

Proceedings Article | 30 October 2007 Paper
Rainer Pforr, Mario Hennig, Jens Reichelt, Guy Ben Zvi, Martin Sczyrba
Proceedings Volume 6730, 673032 (2007) https://doi.org/10.1117/12.746695
KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Signal attenuation, Scanners, Scanning electron microscopy, Glasses, Data corrections, Transmittance, Manufacturing

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 634913 (2006) https://doi.org/10.1117/12.685983
KEYWORDS: Photomasks, Diffraction, Polarization, Etching, Lithography, Semiconducting wafers, Lithographic illumination, Printing, Phase shifts, Electroluminescence

Proceedings Article | 20 May 2006 Paper
Proceedings Volume 6283, 62830E (2006) https://doi.org/10.1117/12.681741
KEYWORDS: Photomasks, Critical dimension metrology, Deep ultraviolet, Semiconducting wafers, Signal attenuation, Resistance, Excimer lasers, Glasses, Manufacturing, Scanners

Proceedings Article | 21 March 2006 Paper
Proceedings Volume 6154, 615448 (2006) https://doi.org/10.1117/12.656222
KEYWORDS: Photomasks, Scanners, Semiconducting wafers, Diffraction, Phase shifts, Etching, Cadmium sulfide, Critical dimension metrology, Polarization, Quartz

Showing 5 of 31 publications
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