Dr. Rainer Pforr
at RP Consulting
SPIE Involvement:
Author
Publications (31)

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Multilayers, Deep ultraviolet, Lenses, Signal attenuation, Scanners, Objectives, Photomasks, Critical dimension metrology, Chemical elements, Semiconducting wafers

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Signal attenuation, Glasses, Scanners, Manufacturing, Scanning electron microscopy, Transmittance, Photomasks, Critical dimension metrology, Semiconducting wafers, Data corrections

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Diffraction, Lithographic illumination, Polarization, Etching, Electroluminescence, Printing, Photomasks, Semiconducting wafers, Phase shifts

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Deep ultraviolet, Signal attenuation, Glasses, Scanners, Manufacturing, Resistance, Photomasks, Excimer lasers, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 21 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Diffraction, Polarization, Etching, Quartz, Scanners, Photomasks, Cadmium sulfide, Critical dimension metrology, Semiconducting wafers, Phase shifts

Showing 5 of 31 publications
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