Rainer M. Schmid
Product Manager E-Beam Products at Carl Zeiss SMT Inc
SPIE Involvement:
Publications (7)

Proceedings Article | 21 June 2006 Paper
Proceedings Volume 6281, 628108 (2006) https://doi.org/10.1117/12.692728
KEYWORDS: Polarization, Photomasks, Scanners, Reticles, Semiconducting wafers, Transmittance, Phase shifts, Printing, Immersion lithography, Semiconductors

Proceedings Article | 28 June 2005 Paper
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617508
KEYWORDS: Photomasks, Scanners, Semiconducting wafers, Polarization, Liquids, Reticles, Critical dimension metrology, Binary data, Imaging systems, Refractive index

Proceedings Article | 16 June 2005 Paper
Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637309
KEYWORDS: Photomasks, Image resolution, Semiconducting wafers, Lithography, Reticles, Binary data, Optical proximity correction, 193nm lithography, Airborne remote sensing, Scanners

Proceedings Article | 10 May 2005 Paper
Axel Zibold, R. Schmid, A. Seyfarth, M. Waechter, W. Harnisch, H. Doornmalen
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599715
KEYWORDS: Photomasks, Semiconducting wafers, Imaging systems, Reticles, Critical dimension metrology, Optical proximity correction, Lithographic illumination, Scanners, Lithography, 193nm lithography

Proceedings Article | 6 December 2004 Paper
Axel Zibold, Rainer Schmid, Klaus Boehm, Robert Birkner
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569283
KEYWORDS: Photomasks, Critical dimension metrology, Reticles, Semiconducting wafers, Scanners, Lithography, Inspection, Optical proximity correction, Image processing, Scanning electron microscopy

Showing 5 of 7 publications
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