Mr. Rainer M. Schmid
Product Manager E-Beam Products at Carl Zeiss SMT Inc
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | June 21, 2006
Proc. SPIE. 6281, 22nd European Mask and Lithography Conference
KEYWORDS: Semiconductors, Reticles, Polarization, Scanners, Printing, Transmittance, Photomasks, Immersion lithography, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Refractive index, Reticles, Polarization, Imaging systems, Scanners, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data, Liquids

PROCEEDINGS ARTICLE | June 16, 2005
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Scanners, Image resolution, Photomasks, Optical proximity correction, Semiconducting wafers, Binary data, Airborne remote sensing, 193nm lithography

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Lithography, Reticles, Lithographic illumination, Imaging systems, Scanners, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, 193nm lithography

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Lithographic illumination, Scanners, Crystals, Inspection, Raman spectroscopy, Printing, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Image processing, Scanners, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Showing 5 of 7 publications
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