Dr. Rainer Zimmermann
at Synopsys GmbH
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 28 March 2014 Paper
Proc. SPIE. 9053, Design-Process-Technology Co-optimization for Manufacturability VIII
KEYWORDS: Calibration, Manufacturing, 3D modeling, Printing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Optimization (mathematics), Semiconducting wafers

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Modulation, Backscatter, Metals, Ions, Scanning electron microscopy, Image quality, Photomasks, Line width roughness, Acquisition tracking and pointing, Nanoimprint lithography

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Point spread functions, Cadmium, Data modeling, Error analysis, 3D modeling, Critical dimension metrology, Geometrical optics, Virtual reality, Electron beam direct write lithography, Model-based design

Proceedings Article | 21 March 2007 Paper
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Semiconductors, Lithography, Manufacturing, Control systems, Photomasks, Optical proximity correction, Critical dimension metrology, Tolerancing, Product engineering, Design for manufacturability

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Thin films, Metrology, Data modeling, Calibration, Image processing, Error analysis, Image acquisition, Optical proximity correction, Photoresist processing, Process modeling

Showing 5 of 9 publications
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