Raj Bugata
at KLA-Tencor Corp
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | October 5, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Reticles, Metrology, Databases, Manufacturing, Inspection, Computing systems, Photomasks, Operating systems, Semiconducting wafers, Defect inspection

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