Dr. Raj Sakamuri
Sr. Research Chemist at FUJIFILM Electronic Materials USA Inc
SPIE Involvement:
Author
Publications (11)

SPIE Journal Paper | October 1, 2005
JM3 Vol. 4 Issue 04
KEYWORDS: Etching, Polymers, Surface roughness, Fluorine, Plasmas, Scanning electron microscopy, Resistance, Oxides, Plasma etching, Chlorine

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Contamination, Deep ultraviolet, Coating, Scanning electron microscopy, Photomasks, Thin film coatings, Semiconducting wafers, Binary data, Phase shifts

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Refractive index, Lithium, Contamination, Water, Interferometry, Doping, Immersion lithography, Thin film coatings, Semiconducting wafers

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Data modeling, Interfaces, Diffusion, Coating, Photoresist materials, Immersion lithography, Semiconducting wafers, Systems modeling, Photoresist developing

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Optical lithography, Cadmium, Polymers, Line width roughness, Transistors, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Chemically amplified resists

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Contamination, Deep ultraviolet, Coating, Photomasks, Absorbance, Thin film coatings, Semiconducting wafers, Binary data, Phase shifts

Showing 5 of 11 publications
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