Dr. Rajesh Nagpal
Assistant Engineering Manager at Intel Corp
SPIE Involvement:
Publications (7)

Proceedings Article | 30 September 2009 Paper
Jun Kim, Wei-Guo Lei, Joan McCall, Suheil Zaatri, Michael Penn, Rajesh Nagpal, Lev Faivishevsky, Michael Ben-Yishai, Udy Danino, Aviram Tam, Oded Dassa, Vivek Balasubramanian, Tejas Shah, Mark Wagner, Shmoolik Mangan
Proceedings Volume 7488, 748808 (2009) https://doi.org/10.1117/12.829637
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Defect detection, Data modeling, Wafer-level optics, Airborne remote sensing, Transform theory, Detection and tracking algorithms, Scanners

Proceedings Article | 19 May 2008 Paper
Proceedings Volume 7028, 70281H (2008) https://doi.org/10.1117/12.793058
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Reticles, Defect inspection, Wafer inspection, Defect detection, Lithography, Critical dimension metrology, Contamination

Proceedings Article | 20 May 2006 Paper
Proceedings Volume 6283, 628329 (2006) https://doi.org/10.1117/12.681779
KEYWORDS: Laser ablation, Deep ultraviolet, Electrons, Photomasks, Femtosecond phenomena, Chromium, Pulsed laser operation, Microscopes, Critical dimension metrology, Absorption

Proceedings Article | 10 May 2005 Paper
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.604717
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Deep ultraviolet, Scanning electron microscopy, Atomic force microscopy, Contamination, Defect inspection, Extreme ultraviolet lithography, EUV optics

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569176
KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Extreme ultraviolet lithography, Reflectivity, Metrology, Lithography, Optical lithography, Standards development, Mask making

Showing 5 of 7 publications
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