Dr. Rajesh Nagpal
Assistant Engineering Manager at Intel Corp
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 30 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Wafer-level optics, Defect detection, Detection and tracking algorithms, Data modeling, Scanners, Inspection, Transform theory, Photomasks, Semiconducting wafers, Airborne remote sensing

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Reticles, Contamination, Defect detection, Inspection, Wafer inspection, Photomasks, Critical dimension metrology, Semiconducting wafers, Defect inspection

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Microscopes, Femtosecond phenomena, Deep ultraviolet, Electrons, Chromium, Laser ablation, Photomasks, Critical dimension metrology, Pulsed laser operation, Absorption

Proceedings Article | 10 May 2005 Paper
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Contamination, Deep ultraviolet, Inspection, Atomic force microscopy, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics, Defect inspection

Proceedings Article | 6 December 2004 Paper
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Metrology, Optical lithography, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, Standards development

Showing 5 of 7 publications
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