Dr. Rajesh Nagpal
Assistant Engineering Manager at Intel Corp
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 30 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Wafer-level optics, Defect detection, Detection and tracking algorithms, Data modeling, Scanners, Inspection, Transform theory, Photomasks, Semiconducting wafers, Airborne remote sensing

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Reticles, Contamination, Defect detection, Inspection, Wafer inspection, Photomasks, Critical dimension metrology, Semiconducting wafers, Defect inspection

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Microscopes, Femtosecond phenomena, Deep ultraviolet, Electrons, Chromium, Laser ablation, Photomasks, Critical dimension metrology, Pulsed laser operation, Absorption

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Contamination, Deep ultraviolet, Inspection, Atomic force microscopy, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics, Defect inspection

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Metrology, Optical lithography, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, Standards development

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Optical lithography, Etching, Coating, Inspection, Reflectivity, Chromium, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Ruthenium

Showing 5 of 7 publications
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