Mr. Rajiv Naresh Sejpal Profile

Rajiv Naresh Sejpal

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Publications (3)

Proceedings Article | 20 March 2020 Presentation + Paper

Realizing more accurate OPC models by utilizing SEM contours

Chih-I Wei, Rajiv Sejpal, Yunfei Deng, Ir Kusnadi, Germain Fenger, Masahiro Oya, Yosuke Okamoto, Kotaro Maruyama, Yuichiro Yamazaki, Sayantan Das, Sandip Halder, Werner Gillijns

Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV

KEYWORDS: Metrology, Data modeling, Calibration, Image processing, 3D modeling, Scanning electron microscopy, Image quality, Photomasks, Optical proximity correction, Semiconducting wafers

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Proceedings Article | 26 September 2019 Paper

Exploring alternative EUV mask absorber for iN5 self-aligned block and contact layers

Rajiv Sejpal, Vicky Philipsen, Ana Armeanu, Chih-I Wei, Werner Gillijns, Neal Lafferty, Germain Fenger, Eric Hendrickx

Proc. SPIE. 11148, Photomask Technology 2019

KEYWORDS: Lithography, Phase shifting, Logic, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction, SRAF, Nanoimprint lithography

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Proceedings Article | 21 March 2019 Paper

SALELE process from theory to fabrication

Youssef Drissi, Werner Gillijns, Jae Uk Lee, Ryan Ryoung han Kim , Ahmed Hamed-Fatehy, Rehab Kotb, Rajiv Naresh Sejpal, Germain Fenger, James Word

Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII

KEYWORDS: Metrology, Optical lithography, Visualization, Metals, Manufacturing, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Optical proximity correction

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