Rajiv Naresh Sejpal
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Data modeling, Calibration, Image processing, 3D modeling, Scanning electron microscopy, Image quality, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Phase shifting, Logic, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction, SRAF, Nanoimprint lithography

Proceedings Article | 21 March 2019 Paper
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Metrology, Optical lithography, Visualization, Metals, Manufacturing, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Optical proximity correction

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