Rajul Randive
Director Applications Engineering at Crystal IS Inc
SPIE Involvement:
Publications (10)

Proceedings Article | 27 May 2009 Paper
Patrick Kearney, C. C. Lin, Takashi Sugiyama, Henry Yun, Rajul Randive, Ira Reiss, Alan Hayes, Paul Mirkarimi, Eberhard Spiller
Proceedings Volume 7470, 74700X (2009) https://doi.org/10.1117/12.835195
KEYWORDS: Etching, Photomasks, Extreme ultraviolet lithography, Ion beams, Inspection, Extreme ultraviolet, Deposition processes, Particles, Manufacturing, Ions

Proceedings Article | 17 October 2008 Paper
A. Hayes, R. Randive, I. Reiss, J. Menendez, P. Kearney, T. Sugiyama
Proceedings Volume 7122, 71223O (2008) https://doi.org/10.1117/12.801870
KEYWORDS: Particles, Photomasks, Aluminum, Contamination, Extreme ultraviolet, Chromium, Electrodes, Silicon, Iron, Particle contamination

Proceedings Article | 21 March 2008 Paper
Proceedings Volume 6921, 69211X (2008) https://doi.org/10.1117/12.774505
KEYWORDS: Etching, Photomasks, Extreme ultraviolet lithography, Ion beams, Extreme ultraviolet, Manufacturing, Particles, Inspection, Ions, Deposition processes

Proceedings Article | 3 May 2007 Paper
Chan-Uk Jeon, Patrick Kearney, Andy Ma, Bernd Beier, Toshyuki Uno, Rajul Randive, Ira Reiss
Proceedings Volume 6533, 653310 (2007) https://doi.org/10.1117/12.737160
KEYWORDS: Particles, Etching, Photomasks, Silicon, Extreme ultraviolet lithography, Ion beams, Coating, Multilayers, Ions, Atomic force microscopy

Proceedings Article | 15 March 2007 Paper
Proceedings Volume 6517, 651726 (2007) https://doi.org/10.1117/12.712103
KEYWORDS: Particles, Etching, Silicon, Photomasks, Extreme ultraviolet lithography, Ion beams, Atomic force microscopy, Ions, Inspection, Coating

Showing 5 of 10 publications
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