Rajul Randive
Director Applications Engineering at Crystal IS Inc
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Author
Publications (10)

PROCEEDINGS ARTICLE | May 27, 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Etching, Particles, Ions, Manufacturing, Inspection, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Deposition processes

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Contamination, Iron, Electrodes, Particles, Silicon, Chromium, Photomasks, Extreme ultraviolet, Aluminum, Particle contamination

PROCEEDINGS ARTICLE | March 21, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Etching, Particles, Ions, Manufacturing, Inspection, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Deposition processes

PROCEEDINGS ARTICLE | May 3, 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Multilayers, Etching, Particles, Ions, Silicon, Coating, Atomic force microscopy, Ion beams, Photomasks, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 15, 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Etching, Particles, Ions, Silicon, Coating, Inspection, Atomic force microscopy, Ion beams, Photomasks, Extreme ultraviolet lithography

SPIE Journal Paper | April 1, 2006
JM3 Vol. 5 Issue 02
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Multilayers, Coating, Particles, Reflectivity, Silicon, Ions, Ion beams, Quartz

Showing 5 of 10 publications
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