Dr. Ralf Neubauer
at Advanced Mask Technology Ctr
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 1 April 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Atrial fibrillation, Calibration, Etching, 3D modeling, Printing, Photomasks, Optical proximity correction, Mask making, 193nm lithography

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Diffraction, Lithographic illumination, Polarization, Etching, Electroluminescence, Printing, Photomasks, Semiconducting wafers, Phase shifts

Proceedings Article | 21 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Diffraction, Polarization, Etching, Quartz, Scanners, Photomasks, Cadmium sulfide, Critical dimension metrology, Semiconducting wafers, Phase shifts

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Phase shifting, Diffractive optical elements, Etching, Quartz, Dry etching, Polymers, Ions, Photomasks, Reactive ion etching, Plasma

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