Dr. Ralf Ziebold
at Qimonda Dresden GmbH & Co OHG
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Diffraction, Lithographic illumination, Polarization, Etching, Electroluminescence, Printing, Photomasks, Semiconducting wafers, Phase shifts

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Diffraction, Polarization, Reflection, Manufacturing, Photomasks, Immersion lithography, Semiconducting wafers, Binary data, Phase shifts, Diffraction gratings

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Optical lithography, Photomasks, Resolution enhancement technologies

Proceedings Article | 14 May 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Diffractive optical elements, Data modeling, Calibration, Diffusion, Computer simulations, 3D modeling, Photomasks, Optimization (mathematics), Semiconducting wafers

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Data modeling, Manufacturing, Scanning electron microscopy, Printing, Data processing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

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