Dr. Ralph E. Schlief
MTS Process Engineer
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 904838 (2014) https://doi.org/10.1117/12.2048311
KEYWORDS: Fiber optic illuminators, Extreme ultraviolet, Photomasks, Printing, Phase shifts, Diffraction, Lithographic illumination, SRAF, Extreme ultraviolet lithography, Projection systems

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 86790V (2013) https://doi.org/10.1117/12.2009281
KEYWORDS: Optical proximity correction, Photomasks, Extreme ultraviolet, Calibration, Extreme ultraviolet lithography, Deep ultraviolet, Lithography, Metrology, Data modeling, Semiconducting wafers

Proceedings Article | 23 March 2012 Paper
Proceedings Volume 8322, 83221M (2012) https://doi.org/10.1117/12.916171
KEYWORDS: Optical proximity correction, Extreme ultraviolet, Photomasks, Deep ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Lithography, Critical dimension metrology, Printing, Monte Carlo methods

Proceedings Article | 14 March 2012 Paper
Jongwook Kye, Obert Wood, Xuelian Zhu, James H.-C. Chen, Ming He, Tom Wallow, Hirokazu Kato, Cecilia Smolinski, Gregory McIntyre, Yunpeng Yin, Sudhar Raghunathan, Deniz Civay, Pak Leung, Susan S.-C. Fan, Alfred Wagner, Daniel Corliss, John Arnold, Emily Gallagher, Lei Sun, Guillaume Landie, Timothy Brunner, Craig Higgins, Chiew-Seng Koay, Ralph Schlief, Matthew Colburn, Scott Halle, Karen Petrillo, Satoshi Nagai, Martin Burkhardt
Proceedings Volume 8322, 832203 (2012) https://doi.org/10.1117/12.916292
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Manufacturing, Lithography, Immersion lithography, Optical lithography, Metals, Semiconducting wafers, Overlay metrology

Proceedings Article | 1 April 2008 Paper
Thomas Henkel, Roderick Koehle, Nicolo Morgana, Molela Moukara, Franck Jauzion-Graverolle, Christoph Noelscher, Ralph Schlief, Mario Hennig, Ralf Neubauer
Proceedings Volume 6924, 692446 (2008) https://doi.org/10.1117/12.772806
KEYWORDS: Photomasks, Optical proximity correction, Etching, Atrial fibrillation, Printing, Calibration, 3D modeling, 193nm lithography, Lithography, Mask making

Showing 5 of 13 publications
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