Dr. Ralph E. Schlief Profile

Dr. Ralph E. Schlief

MTS Process Engineer

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Author

Publications (13)

Proceedings Article | 17 April 2014 Paper

Clear sub-resolution assist features for EUV

Martin Burkhardt, Greg McIntyre, Ralph Schlief, Lei Sun

Proceedings Volume 9048, 904838 (2014) https://doi.org/10.1117/12.2048311

KEYWORDS: Fiber optic illuminators, Extreme ultraviolet, Photomasks, Printing, Phase shifts, Diffraction, Lithographic illumination, SRAF, Extreme ultraviolet lithography, Projection systems

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Proceedings Article | 1 April 2013 Paper

Evaluation of methods to improve EUV OPC model accuracy

Tamer Coskun, Chris Clifford, Germain Fenger, Gek Soon Chua, Keith Standiford, Ralph Schlief, Craig Higgins, Yi Zou

Proceedings Volume 8679, 86790V (2013) https://doi.org/10.1117/12.2009281

KEYWORDS: Optical proximity correction, Photomasks, Extreme ultraviolet, Calibration, Extreme ultraviolet lithography, Deep ultraviolet, Lithography, Metrology, Data modeling, Semiconducting wafers

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Proceedings Article | 23 March 2012 Paper

EUV OPC for the 20-nm node and beyond

Chris Clifford, Yi Zou, Azat Latypov, Oleg Kritsun, Thomas Wallow, Harry Levinson, Fan Jiang, Deniz Civay, Keith Standiford, Ralph Schlief, Lei Sun, Obert Wood, Sudhar Raghunathan, Pawitter Mangat, Hui Peng Koh, Craig Higgins, Jeffrey Schefske, Mandeep Singh

Proceedings Volume 8322, 83221M (2012) https://doi.org/10.1117/12.916171

KEYWORDS: Optical proximity correction, Extreme ultraviolet, Photomasks, Deep ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Lithography, Critical dimension metrology, Printing, Monte Carlo methods

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Proceedings Article | 14 March 2012 Paper

Insertion strategy for EUV lithography

Obert Wood, John Arnold, Timothy Brunner, Martin Burkhardt, James H.-C. Chen, Deniz Civay, Susan S.-C. Fan, Emily Gallagher, Scott Halle, Ming He, Craig Higgins, Hirokazu Kato, Jongwook Kye, Chiew-Seng Koay, Guillaume Landie, Pak Leung, Gregory McIntyre, Satoshi Nagai, Karen Petrillo, Sudhar Raghunathan, Ralph Schlief, Lei Sun, Alfred Wagner, Tom Wallow, Yunpeng Yin, Xuelian Zhu, Matthew Colburn, Daniel Corliss, Cecilia Smolinski

Proceedings Volume 8322, 832203 (2012) https://doi.org/10.1117/12.916292

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Manufacturing, Lithography, Immersion lithography, Optical lithography, Metals, Semiconducting wafers, Overlay metrology

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Proceedings Article | 1 April 2008 Paper

AltPSM contact hole application at DRAM 4xnm nodes with dry 193nm lithography

Christoph Noelscher, Thomas Henkel, Franck Jauzion-Graverolle, Mario Hennig, Nicolo Morgana, Ralph Schlief, Molela Moukara, Roderick Koehle, Ralf Neubauer

Proceedings Volume 6924, 692446 (2008) https://doi.org/10.1117/12.772806

KEYWORDS: Photomasks, Optical proximity correction, Etching, Atrial fibrillation, Printing, Calibration, 3D modeling, 193nm lithography, Lithography, Mask making

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Proceedings Article | 28 March 2007 Paper

Modular process modeling for OPC

M. Keck, C. Bodendorf, T. Schmidtling, R. Schlief, R. Wildfeuer, S. Zumpe, M. Niehoff

Proceedings Volume 6520, 652044 (2007) https://doi.org/10.1117/12.716295

KEYWORDS: Optical proximity correction, Process modeling, Data modeling, Photoresist processing, Etching, Error analysis, Scanning electron microscopy, 3D modeling, Wafer-level optics, Statistical modeling

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Proceedings Article | 20 March 2006 Paper

Verifying high NA polarization OPC treatment on wafer

Ralph Schlief, Mario Hennig, Rainer Pforr, Jörg Thiele, Max Hoepfl

Proceedings Volume 6154, 61543F (2006) https://doi.org/10.1117/12.656621

KEYWORDS: Optical proximity correction, Polarization, Data modeling, Scanners, SRAF, Photomasks, Semiconducting wafers, Process modeling, Printing, Scanning electron microscopy

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Proceedings Article | 12 May 2005 Paper

Effect of data selection and noise on goodness of OPC model fit

Ralph Schlief

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598442

KEYWORDS: Data modeling, Process modeling, Optical proximity correction, Statistical modeling, Calibration, Scanning electron microscopy, Error analysis, Solids, Mathematical modeling, MATLAB

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Proceedings Article | 28 May 2004 Paper

Impact of measured pupil illumination fill distribution on lithography simulation and OPC models

Christof Bodendorf, Ralph Schlief, Ralf Ziebold

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535575

KEYWORDS: Optical proximity correction, Process modeling, Lithographic illumination, Lithography, Scanners, Photomasks, Head, Computer simulations, Optical lithography, Coherence imaging

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Proceedings Article | 28 May 2004 Paper

Full-chip OPC treatment using vector thin film models

Ralph Schlief

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535713

KEYWORDS: Optical proximity correction, Thin films, Process modeling, Data modeling, Image processing, Diffusion, Apodization, Optical lithography, Calibration, Photoresist processing

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Proceedings Article | 30 July 2002 Paper

Hopkins versus Abbe: a lithography simulation matching study

Ralph Schlief, Armin Liebchen, J. Fung Chen

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474491

KEYWORDS: Titanium, Platinum, Photomasks, Reticles, Lithography, Computer simulations, Error analysis, Optical proximity correction, Binary data, Fiber optic illuminators

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Proceedings Article | 16 July 2002 Paper

Impact on OPC treatment accuracy due to illumination pupil shape deviation for 110-nm target CD

Sabita Roy, Ralph Schlief, Stephen Hsu, Xuelong Shi, Armin Liebchen, J. Fung Chen, Steven Hansen

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473414

KEYWORDS: Critical dimension metrology, Optical proximity correction, Photomasks, Edge roughness, Lithographic illumination, Tolerancing, Lithography, Scanners, Printing, Scattering

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Proceedings Article | 5 July 2000 Paper

Understanding lens aberration and influences to lithographic imaging

Bruce Smith, Ralph Schlief

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389018

KEYWORDS: Diffraction, Lithography, Monochromatic aberrations, Image processing, Optical proximity correction, Phase shifts, Coherence (optics), Photomasks, Phase measurement, Phase shift keying

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Showing 5 of 13 publications

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