Dr. Ralph E. Schlief
MTS Process Engineer at
SPIE Involvement:
Author
Publications (13)

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Diffraction, Lithographic illumination, Printing, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, SRAF, Phase shifts, Fiber optic illuminators

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Metrology, Data modeling, Deep ultraviolet, Calibration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Deep ultraviolet, Printing, Monte Carlo methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 14, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Optical lithography, Metals, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Immersion lithography, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 1, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Atrial fibrillation, Calibration, Etching, 3D modeling, Printing, Photomasks, Optical proximity correction, Mask making, 193nm lithography

PROCEEDINGS ARTICLE | March 28, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Wafer-level optics, Data modeling, Etching, Error analysis, 3D modeling, Scanning electron microscopy, Optical proximity correction, Photoresist processing, Statistical modeling, Process modeling

Showing 5 of 13 publications
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