Dr. Ralph E. Schlief
MTS Process Engineer
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 17 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Fiber optic illuminators, Extreme ultraviolet, Photomasks, Printing, Phase shifts, Diffraction, Lithographic illumination, SRAF, Extreme ultraviolet lithography, Projection systems

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Optical proximity correction, Photomasks, Extreme ultraviolet, Calibration, Extreme ultraviolet lithography, Deep ultraviolet, Lithography, Metrology, Data modeling, Semiconducting wafers

Proceedings Article | 23 March 2012 Paper
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Optical proximity correction, Extreme ultraviolet, Photomasks, Deep ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Lithography, Critical dimension metrology, Printing, Monte Carlo methods

Proceedings Article | 14 March 2012 Paper
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Manufacturing, Lithography, Immersion lithography, Optical lithography, Metals, Semiconducting wafers, Overlay metrology

Proceedings Article | 1 April 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Photomasks, Optical proximity correction, Etching, Atrial fibrillation, Printing, Calibration, 3D modeling, 193nm lithography, Lithography, Mask making

Showing 5 of 13 publications
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