Ram Peltinov
CD SEM Product Manager at Applied Materials Inc
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Publications (22)

Proceedings Article | 16 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Lithography, Metrology, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Edge roughness

Proceedings Article | 2 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Lithography, Metrology, Data modeling, Scattering, Laser scattering, Scanning electron microscopy, Photoresist materials, Monte Carlo methods, Extreme ultraviolet lithography, Critical dimension metrology

Proceedings Article | 24 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Metrology, Contamination, Roentgenium, Data modeling, Scanning electron microscopy, Photoresist materials, Monte Carlo methods, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 23 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Etching, Manufacturing, Line width roughness, Transistors, Optical proximity correction, Computer aided design, Semiconducting wafers, Device simulation, Electrochemical etching

Proceedings Article | 13 March 2009 Paper
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Lithography, Optical lithography, Photoresist materials, Process control, Design for manufacturing, Line width roughness, Transistors, Optical proximity correction, Line edge roughness, Photoresist developing

Showing 5 of 22 publications
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