Rama Tweg
Photolighography Area Manager at Tower Semiconductor Ltd
SPIE Involvement:
Publications (4)

Proceedings Article | 27 March 2007 Paper
Iryna Titarenko, Enna Altshuler, Rama Tweg
Proceedings Volume 6520, 65204D (2007) https://doi.org/10.1117/12.708892
KEYWORDS: Etching, Optical proximity correction, Silicon, Data modeling, Scanning electron microscopy, Calibration, Standards development, Mathematical modeling, Semiconducting wafers, Visual process modeling

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.593125
KEYWORDS: Photomasks, Manufacturing, Calibration, Optical proximity correction, Lithography, Yield improvement, Artificial intelligence, Design for manufacturability, Design for manufacturing, Photoresist processing

Proceedings Article | 6 December 2004 Paper
Peter Nikolsky, Rama Tweg, Enna Altshuler, Eitan Shauly
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568999
KEYWORDS: Line edge roughness, Optical proximity correction, Optical lithography, Calibration, Atomic force microscopy, Scanning electron microscopy, Line width roughness, Lithography, 3D metrology, Standards development

Proceedings Article | 14 June 1999 Paper
Shani Keysar, Leah Markowitz, Corin Ben-Gigi, Rama Tweg, Ayelet Margalit-Ilovich, Avishai Kepten, Amir Wachs, Roey Shaviv
Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350815
KEYWORDS: Lithography, Metals, Dielectrics, Semiconducting wafers, Scanning electron microscopy, Chemical mechanical planarization, Optical lithography, Wafer testing, Hydrogen, Chemistry

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