Ms. Rama Tweg Profile

Rama Tweg

Photolighography Area Manager at Tower Semiconductor Ltd

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Publications (4)

Proceedings Article | 27 March 2007 Paper

Geometrical description of the microloading effect in silicon trench structures

Iryna Titarenko, Enna Altshuler, Rama Tweg

Proceedings Volume 6520, 65204D (2007) https://doi.org/10.1117/12.708892

KEYWORDS: Etching, Optical proximity correction, Silicon, Data modeling, Scanning electron microscopy, Calibration, Standards development, Mathematical modeling, Semiconducting wafers, Visual process modeling

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Proceedings Article | 6 December 2004 Paper

A complementary lithographic simulation method for improved yields following full-chip DRC

Peter Nikolsky, Rama Tweg, Mike Pochkowski

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.593125

KEYWORDS: Photomasks, Manufacturing, Calibration, Optical proximity correction, Lithography, Yield improvement, Artificial intelligence, Design for manufacturability, Design for manufacturing, Photoresist processing

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Proceedings Article | 6 December 2004 Paper

LER characterization and impact on 0.13-µm lithography for OPC modeling

Peter Nikolsky, Rama Tweg, Enna Altshuler, Eitan Shauly

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568999

KEYWORDS: Line edge roughness, Optical proximity correction, Optical lithography, Calibration, Atomic force microscopy, Scanning electron microscopy, Line width roughness, Lithography, 3D metrology, Standards development

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Proceedings Article | 14 June 1999 Paper

Effect of the control of global planarity of intermetal dielectric layers on the lithographic process window

Shani Keysar, Leah Markowitz, Corin Ben-Gigi, Rama Tweg, Ayelet Margalit-Ilovich, Avishai Kepten, Amir Wachs, Roey Shaviv

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350815

KEYWORDS: Lithography, Metals, Dielectrics, Semiconducting wafers, Scanning electron microscopy, Chemical mechanical planarization, Optical lithography, Wafer testing, Hydrogen, Chemistry

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