Rama Tweg
Photolighography Area Manager at Tower Semiconductor Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 27 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Mathematical modeling, Visual process modeling, Data modeling, Calibration, Etching, Silicon, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Standards development

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Optical lithography, Calibration, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Line width roughness, Optical proximity correction, Line edge roughness, Standards development

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Calibration, Manufacturing, Design for manufacturing, Photomasks, Artificial intelligence, Optical proximity correction, Photoresist processing, Yield improvement, Design for manufacturability

Proceedings Article | 14 June 1999
Proc. SPIE. 3677, Metrology, Inspection, and Process Control for Microlithography XIII
KEYWORDS: Lithography, Optical lithography, Metals, Dielectrics, Hydrogen, Chemistry, Scanning electron microscopy, Semiconducting wafers, Wafer testing, Chemical mechanical planarization

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