Dr. Ramakrishnan Ganesan
Postdoctoral Researcher at KAIST
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | May 2, 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Etching, Polymers, Image processing, Silicon, Oxygen, Plasma etching, Line edge roughness, Reactive ion etching, Photoresist processing, Plasma

PROCEEDINGS ARTICLE | April 12, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Proteins, Optical lithography, Polymers, Glasses, Ultraviolet radiation, Chemistry, Photoresist materials, Tissue engineering, Photoresist processing

PROCEEDINGS ARTICLE | April 2, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Deep ultraviolet, Etching, Polymers, Ultraviolet radiation, Diffusion, Resistance, Lamps, Printing, Absorbance

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Near ultraviolet, Etching, Silicon, Chemistry, Scanning electron microscopy, Photoresist materials, Epoxies, Cesium, Semiconducting wafers

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Polymers, Ultraviolet radiation, Silicon, Solids, Absorbance, Sodium, Photomicroscopy, Semiconducting wafers, Standards development

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