Ramana Murthy V.M. Pusuluri
Research Engineer at
SPIE Involvement:
Author
Publications (3)

SPIE Journal Paper | April 28, 2018
JM3 Vol. 17 Issue 02
KEYWORDS: Calibration, Data modeling, Process modeling, Autoregressive models, Lithography, Photomasks, Statistical modeling, Monte Carlo methods, Photoresist processing, Optical proximity correction

PROCEEDINGS ARTICLE | May 23, 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Wafer-level optics, Lithography, Data modeling, Polarization, Calibration, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Process modeling

PROCEEDINGS ARTICLE | May 20, 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Computer simulations, SRAF, Electronic design automation, Resolution enhancement technologies, Current controlled current source

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