Dr. Ramasamy Raju
Postdoctoral Research Associate at Univ of Illinois
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Semiconductors, Argon, Sputter deposition, Image processing, Ions, Scanning electron microscopy, Photoresist materials, Ion beams, Line width roughness, Line edge roughness

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Carbon, Contamination, Chemical species, Particles, Silicon, Photomasks, Extreme ultraviolet lithography, Helium, Semiconducting wafers, Plasma

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Mirrors, Contamination, Reflectivity, Photodiodes, Extreme ultraviolet, Chlorine, Plasma systems, Chlorine gas, Plasma, Tin

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Carbon, Contamination, Sensors, Particles, Ions, Silicon, Oxygen, Extreme ultraviolet, Silicon carbide, Plasma

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Chemical species, Particles, Silicon, Photomasks, Extreme ultraviolet lithography, Helium, Semiconducting wafers, Atmospheric particles, Plasma

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Semiconductors, Argon, Sputter deposition, Ions, Scanning electron microscopy, Photoresist materials, Ion beams, Line width roughness, Line edge roughness, Grazing incidence

Showing 5 of 9 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top