Dr. Ramil-Marcelo L. Mercado
Managing Director R&D at Brewer Science Inc
SPIE Involvement:
Author
Publications (15)

PROCEEDINGS ARTICLE | March 31, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Lithographic illumination, Polymers, Scanners, Silicon, Diffusion, Photography, Scanning electron microscopy, Photoresist materials, Photoresist developing

PROCEEDINGS ARTICLE | March 26, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Polymers, Diffusion, Chemistry, Photoresist materials, Picosecond phenomena, Semiconducting wafers, Photoresist developing, Standards development, Quenching (fluorescence)

PROCEEDINGS ARTICLE | December 11, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Carbon, Lithography, Multilayers, Etching, Image processing, Silicon, Photoresist materials, Double patterning technology, Photoresist processing, Photoresist developing

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Antireflective coatings, Interferometers, Polymers, Electroluminescence, Scanning electron microscopy, Photoresist materials, Photoresist developing, Polymer thin films, Bandpass filters

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Etching, Polymers, Molecules, Coating, Electroluminescence, Photoresist materials, Photoresist developing, Polymer thin films, Bottom antireflective coatings

PROCEEDINGS ARTICLE | April 15, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Diffractive optical elements, Optical properties, Polymers, Reflectivity, Electroluminescence, Scanning electron microscopy, Photoresist materials, Photoresist developing, Polymer thin films

Showing 5 of 15 publications
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