Dr. Ramil-Marcelo L. Mercado
Managing Director R&D at Brewer Science Inc
SPIE Involvement:
Publications (15)

Proceedings Article | 31 March 2010 Paper
Jim Meador, Alice Guerrero, Joyce Lowes, Charlyn Stroud, Brandy Carr, Anwei Qin, Carlton Washburn, Ramil-Marcelo Mercado
Proceedings Volume 7639, 763926 (2010) https://doi.org/10.1117/12.846927
KEYWORDS: Lithography, Photoresist materials, Silicon, Photoresist developing, Diffusion, Polymers, Lithographic illumination, Scanning electron microscopy, Scanners, Photography

Proceedings Article | 26 March 2010 Paper
Joyce Lowes, Victor Pham, Jim Meador, Charlyn Stroud, Ferdinand Rosas, Ramil-Marcelo Mercado, Mark Slezak
Proceedings Volume 7639, 76390K (2010) https://doi.org/10.1117/12.846608
KEYWORDS: Picosecond phenomena, Photoresist materials, Photoresist developing, Polymers, Lithography, Diffusion, Semiconducting wafers, Standards development, Chemistry, Quenching (fluorescence)

Proceedings Article | 11 December 2009 Paper
Proceedings Volume 7520, 75200M (2009) https://doi.org/10.1117/12.840419
KEYWORDS: Double patterning technology, Photoresist materials, Multilayers, Lithography, Silicon, Carbon, Photoresist processing, Photoresist developing, Image processing, Etching

Proceedings Article | 1 April 2009 Paper
Jim Meador, Joyce Lowes, Charlyn Stroud, Sherilyn Thomas, Yilin Qiu, Ramil-Marcelo Mercado, Victor Pham, Mark Slezak
Proceedings Volume 7273, 727312 (2009) https://doi.org/10.1117/12.813783
KEYWORDS: Lithography, Photoresist materials, Photoresist developing, Polymers, Scanning electron microscopy, Antireflective coatings, Interferometers, Polymer thin films, Electroluminescence, Bandpass filters

Proceedings Article | 4 December 2008 Paper
Proceedings Volume 7140, 71402W (2008) https://doi.org/10.1117/12.804743
KEYWORDS: Polymers, Photoresist developing, Polymer thin films, Photoresist materials, Lithography, Coating, Molecules, Bottom antireflective coatings, Electroluminescence, Etching

Showing 5 of 15 publications
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