This work focuses on the development of a cryogenic optical profilometry system for the measurement of material properties of thin films across a wide temperature range. A cryostat was machined and integrated with a Zygo NewView 600K optical profilometer and vacuum system. Curvature data were taken for a SiNx thin film on a GaAs substrate from 300 K down to 80 K. From the curvature data, the coefficient of thermal expansion was calculated. The cryogenic optical profilometry system was benchmarked with a three beam curvature technique, and demonstrated excellent agreement across the full temperature range from 300 K to 80 K
Future improvements in spectral imaging systems can be attained through the integration of MEMS-based optical transmission devices matched with pixelated arrays. Such integrated module designs will require a detailed knowledge of the MEMS device optical properties at high spatial resolution and over a wide range of operating conditions. A substantially automated low-cost optical characterization system has been developed, which enables the optical transmission of the MEMS device be measured with high spatial and spectral precision. This Optical Metrology System (OMS) can focus light on the device under test (DUT) to a spot diameter of less than 30 μm, and characterize devices at near infrared for wavelengths within the spectral band from 1.4 μm to 2.6 μm. A future upgrade to the OMS will enable measurements to be carried out across a wide range of DUT temperatures and with a spectral range from visible to long wave infrared wavelengths.