Dr. Rand Cottle
Manager of Metrology at
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 21 June 2006
Proc. SPIE. 6281, 22nd European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Polarization, Etching, Quartz, Manufacturing, Chromium, Photomasks, Semiconducting wafers, Phase shifts

Proceedings Article | 19 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Signal to noise ratio, Lithography, Electron beams, Etching, Molecules, Ions, Image resolution, Scanning electron microscopy, Ion beams, Photomasks

Proceedings Article | 21 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Polarization, Etching, Manufacturing, Chromium, Photomasks, Plasma etching, Chlorine, Semiconducting wafers, Plasma

Proceedings Article | 15 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Polarization, Etching, Manufacturing, Chromium, Photomasks, Plasma etching, Chlorine, Semiconducting wafers, Plasma

Proceedings Article | 9 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Silica, Scattering, Etching, Manufacturing, Chromium, Photomasks, Wet etching, Resolution enhancement technologies

Proceedings Article | 9 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Semiconductors, Lithography, Reticles, Optical lithography, Etching, Manufacturing, Inspection, Photomasks, Nanoimprint lithography, Semiconducting wafers

Showing 5 of 18 publications
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