Dr. Rani S. Ghaida
SPIE Involvement:
Publications (7)

Proceedings Article | 18 March 2015 Paper
Proceedings Volume 9426, 942611 (2015) https://doi.org/10.1117/12.2087094
KEYWORDS: Optical proximity correction, Photomasks, SRAF, Photovoltaics, Model-based design, Very large scale integration, Optical lithography, Data modeling, Image classification, Library classification systems

SPIE Journal Paper | 19 August 2013
JM3, Vol. 12, Issue 03, 033014, (August 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.3.033014
KEYWORDS: Overlay metrology, Semiconducting wafers, Photomasks, Optical alignment, Transistors, Lithography, Manufacturing, Double patterning technology, Systems modeling, Scanners

Proceedings Article | 18 April 2013 Paper
Proceedings Volume 8681, 86810C (2013) https://doi.org/10.1117/12.2013619
KEYWORDS: Overlay metrology, Semiconducting wafers, Ferroelectric LCDs, Optical alignment, Photomasks, Lithography, Systems modeling, Scanners, Dysprosium, Process control

Proceedings Article | 15 March 2012 Paper
Rani Ghaida, Kanak Agarwal, Lars Liebmann, Sani Nassif, Puneet Gupta
Proceedings Volume 8327, 83270M (2012) https://doi.org/10.1117/12.916636
KEYWORDS: Double patterning technology, Optical lithography, Metals, Semiconductors, Photomasks, Manufacturing, Chlorine, Algorithm development, Electrical engineering, Extreme ultraviolet

Proceedings Article | 19 May 2011 Paper
Andrew Neureuther, Juliet Rubinstein, Marshal Miller, Kenji Yamazoe, Eric Chin, Cooper Levy, Lynn Wang, Nuo Xu, Costas Spanos, Kun Qian, Kameshwar Poolla, Justin Ghan, Anand Subramanian, Tsu-Jae King Liu, Xin Sun, Kwangok Jeong, Puneet Gupta, Abde Kaqalwalla, Rani Ghaida, Tuck Boon Chan
Proceedings Volume 8081, 80810N (2011) https://doi.org/10.1117/12.899394
KEYWORDS: Photomasks, Double patterning technology, Lithography, Image processing, Line edge roughness, Algorithm development, Reticles, Inspection, Design for manufacturing, Device simulation

Showing 5 of 7 publications
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