Ranjan Khurana
Senior Member of Technical Staff
SPIE Involvement:
Publications (5)

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Semiconductors, Logic, Optical lithography, Scanners, Process control, Finite element methods, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers

SPIE Journal Paper | 11 September 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Semiconducting wafers, Photomasks, Critical dimension metrology, Quartz, Pulsed laser operation, Signal attenuation, Beam controllers, Deep ultraviolet, Metrology, Process control

Proceedings Article | 28 March 2014 Paper
Proc. SPIE. 9054, Advanced Etch Technology for Nanopatterning III
KEYWORDS: Carbon, Optical lithography, Etching, Dry etching, Inspection, Scanning electron microscopy, Line width roughness, Directed self assembly, Cadmium sulfide, Semiconducting wafers

Proceedings Article | 10 April 2013 Paper
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Metrology, Statistical analysis, Data modeling, Error analysis, Process control, High volume manufacturing, Feedback control, Semiconducting wafers, Statistical modeling, Overlay metrology

Proceedings Article | 21 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Scanners, Distortion, Dysprosium, Optical alignment, Semiconducting wafers, Data corrections, Overlay metrology

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