Dr. Rao Varanasi
Director of Lithography at Pall Corp
SPIE Involvement:
Author
Publications (47)

Proceedings Article | 27 March 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Semiconductors, Lithography, Contamination, Defect detection, Metals, Particles, Photoresist materials, Semiconducting wafers, Wafer testing, Contamination control

Proceedings Article | 25 March 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Semiconductors, Lithography, Metals, Ions, Silicon, Photoresist materials, Head, Adsorption, Semiconductor manufacturing, Sodium, Thin film coatings, Semiconducting wafers, Particle contamination, Chromatography, Ion exchange

Proceedings Article | 8 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Metrology, Microfluidics, Optical lithography, Contamination, Nanoparticles, Particles, Particle filters, Dendrimers, Semiconducting wafers, Testing and analysis, Yield improvement, Contamination control, Neptunium

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Antireflective coatings, Optical lithography, Etching, Coating, Reflectivity, Control systems, Photoresist processing, Standards development, Bottom antireflective coatings

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Oxides, Electron beam lithography, Etching, Ions, Silicon, Gases, Hydrogen, Plasma etching, Reactive ion etching, Plasma

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Semiconductors, Lithography, Optical lithography, Etching, Dielectrics, Scanning electron microscopy, Photomasks, Double patterning technology, Reactive ion etching, Photoresist processing

Showing 5 of 47 publications
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