Mr. Raoul Kirner
at SUSS MicroOptics SA
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Light sources, Continuous wave operation, Lithographic illumination, Crystals, Semiconductor lasers, Diffusers, Photomasks, Beam shaping, Semiconducting wafers

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Continuous wave operation, Microlens array, Lithographic illumination, Diffractive optical elements, Semiconductor lasers, Diffusers, Light sources and illumination, Beam shaping, 193nm lithography

PROCEEDINGS ARTICLE | February 15, 2018
Proc. SPIE. 10511, Solid State Lasers XXVII: Technology and Devices
KEYWORDS: Lithography, Continuous wave operation, Deep ultraviolet, Crystals, Laser applications, Semiconductor lasers, Photomasks, Laser crystals, Nonlinear crystals, Laser systems engineering

PROCEEDINGS ARTICLE | September 27, 2016
Proc. SPIE. 9951, Optical System Alignment, Tolerancing, and Verification X
KEYWORDS: Superposition, Lithography, Point spread functions, Microlens array, Imaging systems, Microlens, Photomasks, Imaging arrays, Semiconducting wafers, Multichannel imaging systems

PROCEEDINGS ARTICLE | May 13, 2013
Proc. SPIE. 8788, Optical Measurement Systems for Industrial Inspection VIII
KEYWORDS: Confocal microscopy, Prisms, Light sources, Imaging systems, Sensors, Spectroscopy, Multiplexing, Colorimetry, Detector arrays, RGB color model

PROCEEDINGS ARTICLE | March 5, 2013
Proc. SPIE. 8613, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI
KEYWORDS: Wafer-level optics, Lithography, Optical lithography, Lithographic illumination, Micro optics, Photomasks, Neodymium, Molybdenum, Semiconducting wafers, Submicron lithography

Showing 5 of 8 publications
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