Raphael Getin
IAPPS Engineer at KLA Corp
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Signal to noise ratio, Metrology, Modulation, Scanners, Scatterometry, Process control, Finite element methods, Critical dimension metrology, Semiconducting wafers, Single crystal X-ray diffraction

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