Dr. Rashi Garg
Defect Metrology Engineer
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Contamination, Carbon, Extreme ultraviolet, Ruthenium, EUV optics, Polymers, Polymerization, Polymer thin films, Mirrors, Extreme ultraviolet lithography

Proceedings Article | 23 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Contamination, Extreme ultraviolet, Carbon, Mirrors, Extreme ultraviolet lithography, Xenon, Error analysis, Neodymium, Ruthenium, Titanium dioxide

Proceedings Article | 23 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon, EUV optics, Imaging systems, Extreme ultraviolet, Extreme ultraviolet lithography, Dielectrics, Polarizers, Ellipsometry, Contamination, Thin films

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon, Contamination, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Reflectivity, Printing, Scanning electron microscopy, Inspection, Lithography

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Photomasks, Contamination, Carbon, Extreme ultraviolet, Scanning electron microscopy, Printing, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Reflectivity

Showing 5 of 12 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top