Dr. Rasit O. Topaloglu
at IBM Corp
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 4 April 2017 Presentation + Paper
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Semiconductors, Lithography, Logic, Detection and tracking algorithms, Data modeling, Manufacturing, Computer simulations, 3D modeling, Monte Carlo methods, Tolerancing, Statistical modeling, Performance modeling, Systems modeling, Process engineering, Design for manufacturability

Proceedings Article | 31 March 2014 Paper
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Optical lithography, 3D modeling, Monte Carlo methods, Photomasks, Directed self assembly, Computational lithography, Critical dimension metrology, Photoresist processing, Instrument modeling

Proceedings Article | 23 March 2012 Paper
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Reticles, Computer simulations, Photomasks, Extreme ultraviolet, Dysprosium, Extreme ultraviolet lithography, Optical alignment, Algorithm development, Tolerancing

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Metals, Manufacturing, Feature extraction, Photomasks, Algorithm development, Standards development, 193nm lithography

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Detection and tracking algorithms, Silicon, Manufacturing, Photomasks, Double patterning technology, Semiconducting wafers, Binary data, Overlay metrology, Standards development

Showing 5 of 9 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top