Dr. Ratnam Sooriyakumaran
at IBM Research - Almaden
SPIE Involvement:
Author
Publications (41)

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Logic, Switching, Opacity, Etching, Dry etching, Manufacturing, Image resolution, Scanning electron microscopy, SRAF, Critical dimension metrology

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Optical microscopes, Switches, Switching, Ultraviolet radiation, Silicon, Lamps, Inspection, Chromium, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Electron beam lithography, Polymers, Ions, Image registration, Image quality, Photomasks, Line edge roughness, Neodymium, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Electron beam lithography, Opacity, Manufacturing, Photomasks, SRAF, Critical dimension metrology, Line edge roughness, Photoresist processing, Binary data, Phase shifts

PROCEEDINGS ARTICLE | March 20, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Gold, Lithography, Electron beams, Polymers, Resistance, Image quality, Neodymium, Thin film coatings, Semiconducting wafers, Chemically amplified resists

PROCEEDINGS ARTICLE | March 20, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Optical lithography, Etching, Hydrogen, Resistance, Fourier transforms, Chemical vapor deposition, Extreme ultraviolet, Double patterning technology, Critical dimension metrology, Fluorine

Showing 5 of 41 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top