Dr. Ratnam Sooriyakumaran
at IBM Research - Almaden
SPIE Involvement:
Author
Publications (41)

Proceedings Article | 17 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Logic, Switching, Opacity, Etching, Dry etching, Manufacturing, Image resolution, Scanning electron microscopy, SRAF, Critical dimension metrology

Proceedings Article | 9 September 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Optical microscopes, Switches, Switching, Ultraviolet radiation, Silicon, Lamps, Inspection, Chromium, Photomasks, Semiconducting wafers

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Electron beam lithography, Polymers, Ions, Image registration, Image quality, Photomasks, Line edge roughness, Neodymium, Photoresist processing, Semiconducting wafers

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Electron beam lithography, Opacity, Manufacturing, Photomasks, SRAF, Critical dimension metrology, Line edge roughness, Photoresist processing, Binary data, Phase shifts

Proceedings Article | 20 March 2012 Paper
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Gold, Lithography, Electron beams, Polymers, Resistance, Image quality, Neodymium, Thin film coatings, Semiconducting wafers, Chemically amplified resists

Showing 5 of 41 publications
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