Dr. Ravi K. Bonam
at IBM Research
SPIE Involvement:
Author
Publications (18)

SPIE Journal Paper | 1 July 2020
JM3 Vol. 19 Issue 03
KEYWORDS: Stochastic processes, _terms under review, Fiber optic illuminators, Line edge roughness, Critical dimension metrology, Defect inspection, Extreme ultraviolet, Inspection, Optical lithography, Yield improvement

SPIE Journal Paper | 20 April 2020
JM3 Vol. 19 Issue 02
KEYWORDS: Data modeling, Convolution, Semiconductors, Defect detection, Performance modeling, Semiconducting wafers, Image classification, Inspection, Content addressable memory, Process modeling

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Stochastic processes, Line edge roughness, Inspection, Defect inspection, Critical dimension metrology, Extreme ultraviolet, Optical lithography, Etching, Bridges

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Photomasks, Semiconducting wafers, Image processing, Extreme ultraviolet lithography, Electron beam lithography, Stochastic processes, Inspection, Line edge roughness, Extreme ultraviolet, Optical proximity correction

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Convolution, Defect detection, Semiconducting wafers, Inspection, Neural networks, Image classification, Semiconductors, Convolutional neural networks

Showing 5 of 18 publications
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