Dr. Ray J. Hoobler
Product Marketing Manager at KLA Corp
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Reticles, Semiconducting wafers, Photomasks, Metrology, Data modeling, Photoresist materials, Scanning electron microscopy, Performance modeling, Systems modeling, Image processing

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Photomasks, Reflectivity, Pellicles, Quartz, Photoresist materials, Data modeling, Metrology, Diffraction, Diffraction gratings, Critical dimension metrology

Proceedings Article | 29 April 2004
Proc. SPIE. 5378, Data Analysis and Modeling for Process Control
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Lithography, Metrology, Error analysis, Scatterometry, Reticles, Photoresist processing, Statistical analysis, Finite element methods

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Etching, Reflectivity, Photomasks, Photoresist materials, Inspection, Process control, Quartz, Critical dimension metrology, Control systems, Spectroscopic ellipsometry

Proceedings Article | 15 July 2003
Proc. SPIE. 5041, Process and Materials Characterization and Diagnostics in IC Manufacturing
KEYWORDS: Silicon, Hydrogen, Semiconducting wafers, Data modeling, Ions, Metrology, Ion beams, Silica, Nondestructive evaluation, Ellipsometry

Showing 5 of 6 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top