Dr. Rebecca Mih Profile

Dr. Rebecca Mih

Director at Lam Research Corp

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Author

Publications (7)

Proceedings Article | 22 January 2001 Paper

Pushing SRAM densities beyond 0.13-um technology in the year 2000

Dennis Hoyniak, Anne McGuire, Andrew Lu, Jay Harrington, Rebecca Mih, Orest Bula, Eric Jasinski

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410741

KEYWORDS: Photomasks, Computer aided design, Semiconducting wafers, Optical proximity correction, Lithography, Manufacturing, Inspection, Photoresist processing, Metals, Mask making

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Proceedings Article | 26 July 1999 Paper

Lithographic implications for Cu/low-k integration

Nora Chen, Kenneth Jantzen, Steven Schneider, James Marsh, Rebecca Mih

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354401

KEYWORDS: Dielectrics, Photomasks, Etching, Lithography, Silicon, Carbon, Reflectivity, Oxides, Metals, Photoresist materials

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Proceedings Article | 29 June 1998 Paper

Polymer-bound sensitizer in i-line resist formulations

Andrew Eckert, Premlatha Jagannathan, Rebecca Mih, Randolph Smith, Kathleen Martinek, Wayne Moreau, Leo Linehan, Charlotte DeWan, Charles Richwine

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312385

KEYWORDS: Polymers, Photoresist materials, Energy transfer, Lithography, Deep ultraviolet, Ultraviolet radiation, Absorbance, Microelectronics, Chemically amplified resists, Resistance

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Proceedings Article | 7 July 1997 Paper

Phase-shift focus monitor applications to lithography tool control

T. Dinh, Donald Wheeler, Eric Solecky, Rebecca Mih

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275968

KEYWORDS: Phase shifts, Lithography, Semiconducting wafers, Overlay metrology, Calibration

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Proceedings Article | 7 June 1996 Paper

How focus budgets are spent: limitations of advanced i-line lithography

Andreas Grassmann, Andreas Kluwe, Rebecca Mih

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240912

KEYWORDS: Semiconducting wafers, Monochromatic aberrations, Lithography, Critical dimension metrology, Control systems, Manufacturing, Deep ultraviolet, Photomasks, Statistical analysis, Sensors

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Proceedings Article | 7 June 1996 Paper

Simulations and experiments with the phase-shift focus monitor

Timothy Brunner, Rebecca Mih

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240909

KEYWORDS: Calibration, Monochromatic aberrations, Semiconducting wafers, Photoresist processing, Overlay metrology, Lithography, Reticles, Phase shifts, Process control, Metrology

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Proceedings Article | 26 May 1995 Paper

Using the focus monitor test mask to characterize lithographic performance

Diane Brown, Alexander Martin, Rebecca Mih, Timothy Brunner, David Long

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209321

KEYWORDS: Semiconducting wafers, Monochromatic aberrations, Photomasks, Lithography, Overlay metrology, Process control, Reticles, Phase shifting, Data processing, Photoresist processing

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Showing 5 of 7 publications

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