Dr. Rebecca Mih
Director at Lam Research Corp
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | January 22, 2001
Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Metals, Manufacturing, Inspection, Photomasks, Optical proximity correction, Mask making, Computer aided design, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | July 26, 1999
Proc. SPIE. 3679, Optical Microlithography XII
KEYWORDS: Oxides, Carbon, Lithography, Etching, Metals, Dielectrics, Silicon, Reflectivity, Photoresist materials, Photomasks

PROCEEDINGS ARTICLE | June 29, 1998
Proc. SPIE. 3333, Advances in Resist Technology and Processing XV
KEYWORDS: Lithography, Deep ultraviolet, Polymers, Ultraviolet radiation, Energy transfer, Resistance, Photoresist materials, Microelectronics, Absorbance, Chemically amplified resists

PROCEEDINGS ARTICLE | July 7, 1997
Proc. SPIE. 3051, Optical Microlithography X
KEYWORDS: Lithography, Calibration, Semiconducting wafers, Overlay metrology, Phase shifts

PROCEEDINGS ARTICLE | June 7, 1996
Proc. SPIE. 2726, Optical Microlithography IX
KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Metrology, Calibration, Process control, Photoresist processing, Semiconducting wafers, Overlay metrology, Phase shifts

PROCEEDINGS ARTICLE | June 7, 1996
Proc. SPIE. 2726, Optical Microlithography IX
KEYWORDS: Lithography, Monochromatic aberrations, Statistical analysis, Deep ultraviolet, Sensors, Manufacturing, Control systems, Photomasks, Critical dimension metrology, Semiconducting wafers

Showing 5 of 7 publications
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