Dr. Rebecca Mih Profile

Dr. Rebecca Mih

Director at Lam Research Corp

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Author

Publications (7)

Proceedings Article | 22 January 2001 Paper

Pushing SRAM densities beyond 0.13-um technology in the year 2000

Orest Bula, Rebecca Mih, Eric Jasinski, Dennis Hoyniak, Andrew Lu, Jay Harrington, Anne McGuire

Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Lithography, Metals, Manufacturing, Inspection, Photomasks, Optical proximity correction, Mask making, Computer aided design, Photoresist processing, Semiconducting wafers

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Proceedings Article | 26 July 1999 Paper

Lithographic implications for Cu/low-k integration

Rebecca Mih, Nora Chen, Kenneth Jantzen, James Marsh, Steven Schneider

Proc. SPIE. 3679, Optical Microlithography XII

KEYWORDS: Oxides, Carbon, Lithography, Etching, Metals, Dielectrics, Silicon, Reflectivity, Photoresist materials, Photomasks

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Proceedings Article | 29 June 1998 Paper

Polymer-bound sensitizer in i-line resist formulations

Premlatha Jagannathan, Charlotte DeWan, Andrew Eckert, Rebecca Mih, Kathleen Martinek, Charles Richwine, Leo Linehan, Wayne Moreau, Randolph Smith

Proc. SPIE. 3333, Advances in Resist Technology and Processing XV

KEYWORDS: Lithography, Deep ultraviolet, Polymers, Ultraviolet radiation, Energy transfer, Resistance, Photoresist materials, Microelectronics, Absorbance, Chemically amplified resists

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Proceedings Article | 7 July 1997 Paper

Phase-shift focus monitor applications to lithography tool control

Donald Wheeler, Eric Solecky, T. Dinh, Rebecca Mih

Proc. SPIE. 3051, Optical Microlithography X

KEYWORDS: Lithography, Calibration, Semiconducting wafers, Overlay metrology, Phase shifts

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Proceedings Article | 7 June 1996 Paper

Simulations and experiments with the phase-shift focus monitor

Timothy Brunner, Rebecca Mih

Proc. SPIE. 2726, Optical Microlithography IX

KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Metrology, Calibration, Process control, Photoresist processing, Semiconducting wafers, Overlay metrology, Phase shifts

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Proceedings Article | 7 June 1996 Paper

How focus budgets are spent: limitations of advanced i-line lithography

Andreas Grassmann, Rebecca Mih, Andreas Kluwe

Proc. SPIE. 2726, Optical Microlithography IX

KEYWORDS: Lithography, Monochromatic aberrations, Statistical analysis, Deep ultraviolet, Sensors, Manufacturing, Control systems, Photomasks, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 26 May 1995 Paper

Using the focus monitor test mask to characterize lithographic performance

Rebecca Mih, Alexander Martin, Timothy Brunner, David Long, Diane Brown

Proc. SPIE. 2440, Optical/Laser Microlithography VIII

KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Phase shifting, Data processing, Process control, Photomasks, Photoresist processing, Semiconducting wafers, Overlay metrology

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Showing 5 of 7 publications

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