Dr. Rebecca Mih Profile

Dr. Rebecca Mih

Director at Lam Research Corp

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Publications (7)

PROCEEDINGS ARTICLE | January 22, 2001

Pushing SRAM densities beyond 0.13-um technology in the year 2000

Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Lithography, Metals, Manufacturing, Inspection, Photomasks, Optical proximity correction, Mask making, Computer aided design, Photoresist processing, Semiconducting wafers

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PROCEEDINGS ARTICLE | July 26, 1999

Lithographic implications for Cu/low-k integration

Proc. SPIE. 3679, Optical Microlithography XII

KEYWORDS: Oxides, Carbon, Lithography, Etching, Metals, Dielectrics, Silicon, Reflectivity, Photoresist materials, Photomasks

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PROCEEDINGS ARTICLE | June 29, 1998

Polymer-bound sensitizer in i-line resist formulations

Proc. SPIE. 3333, Advances in Resist Technology and Processing XV

KEYWORDS: Lithography, Deep ultraviolet, Polymers, Ultraviolet radiation, Energy transfer, Resistance, Photoresist materials, Microelectronics, Absorbance, Chemically amplified resists

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PROCEEDINGS ARTICLE | July 7, 1997

Phase-shift focus monitor applications to lithography tool control

Proc. SPIE. 3051, Optical Microlithography X

KEYWORDS: Lithography, Calibration, Semiconducting wafers, Overlay metrology, Phase shifts

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PROCEEDINGS ARTICLE | June 7, 1996

Simulations and experiments with the phase-shift focus monitor

Proc. SPIE. 2726, Optical Microlithography IX

KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Metrology, Calibration, Process control, Photoresist processing, Semiconducting wafers, Overlay metrology, Phase shifts

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PROCEEDINGS ARTICLE | June 7, 1996

How focus budgets are spent: limitations of advanced i-line lithography

Proc. SPIE. 2726, Optical Microlithography IX

KEYWORDS: Lithography, Monochromatic aberrations, Statistical analysis, Deep ultraviolet, Sensors, Manufacturing, Control systems, Photomasks, Critical dimension metrology, Semiconducting wafers

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PROCEEDINGS ARTICLE | May 26, 1995

Using the focus monitor test mask to characterize lithographic performance

Proc. SPIE. 2440, Optical/Laser Microlithography VIII

KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Phase shifting, Data processing, Process control, Photomasks, Photoresist processing, Semiconducting wafers, Overlay metrology

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Showing 5 of 7 publications

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