Dr. Regina Soufli
Physicist at Lawrence Livermore National Lab
SPIE Involvement:
Senior status | Conference Program Committee | Conference Chair | Conference Co-Chair | Author | Editor | Instructor
Publications (48)

PROCEEDINGS ARTICLE | June 5, 2018
Proc. SPIE. 10691, Advances in Optical Thin Films VI
KEYWORDS: Mirrors, Multilayers, Magnesium, Optical coatings, Extreme ultraviolet, Aluminum, Silicon carbide, Molybdenum, Zirconium, Absorption

PROCEEDINGS ARTICLE | June 5, 2018
Proc. SPIE. 10691, Advances in Optical Thin Films VI
KEYWORDS: Multilayers, Data modeling, X-rays, Interfaces, Silicon, Reflectivity, Silicon carbide, Molybdenum, Systems modeling

SPIE Conference Volume | July 10, 2017

PROCEEDINGS ARTICLE | September 22, 2015
Proc. SPIE. 9589, X-Ray Lasers and Coherent X-Ray Sources: Development and Applications XI
KEYWORDS: Mirrors, Polishing, X-rays, Coating, Wavefronts, Laser beam diagnostics, Free electron lasers, Zerodur, Iridium, Liquid crystal lasers

PROCEEDINGS ARTICLE | September 22, 2015
Proc. SPIE. 9589, X-Ray Lasers and Coherent X-Ray Sources: Development and Applications XI
KEYWORDS: Oxides, Magnesium, Molecules, Crystals, Ions, Corrosion, Mass spectrometry, Laser induced fluorescence, Laser ablation, X-ray lasers

PROCEEDINGS ARTICLE | September 9, 2015
Proc. SPIE. 9591, Target Diagnostics Physics and Engineering for Inertial Confinement Fusion IV
KEYWORDS: Microscopes, Mirrors, Multilayers, Sensors, Calibration, X-rays, Reflectivity, Spatial resolution, X-ray imaging, National Ignition Facility

Showing 5 of 48 publications
Conference Committee Involvement (26)
X-Ray Lasers and Coherent X-Ray Sources: Development and Applications XIII
11 August 2019 | San Diego, California, United States
Advances in Metrology for X-Ray and EUV Optics VIII
11 August 2019 | San Diego, California, United States
Advances in X-Ray/EUV Optics and Components XIV
11 August 2019 | San Diego, California, United States
Advances in X-Ray/EUV Optics and Components XIII
20 August 2018 | San Diego, California, United States
Advances in X-Ray/EUV Optics and Components XII
8 August 2017 | San Diego, California, United States
Showing 5 of 26 published special sections
Course Instructor
SC888: EUV Lithography
This course provides attendees with a full overview of the fundamentals, current status, and technical challenges of EUV Lithography. Topics covered include EUV Sources, EUV Source Metrology, EUV Optics, EUV systems and patterning, and EUV Mask. We will begin with an overview of the history of EUVL and cover EUV sources, EUV source metrology and EUV optics. Next is a discussion of EUVL systems and patterning. We cover the fundamental components of EUV systems and address similarities and differences to optical lithography systems. This section also covers patterning issues including flare, LER, and resist performance. We continue with an exploration of EUVL Mask technology issues such as design, materials including reflective multilayers, process and metrology. Finally we conclude with a Status Review of EUVL. Course material will be drawn from the accompanying texts EUV Sources for Lithography and EUV Lithography.
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