Miss Rehab Kotb Ali
Product Engineer at Mentor Graphics Egypt
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Deep ultraviolet, Metals, Image processing, Manufacturing, Printing, Photomasks, Extreme ultraviolet, Source mask optimization, Optical proximity correction

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Metals, Image processing, Manufacturing, Printing, Image quality, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Optical lithography, Etching, Manufacturing, Printing, Photomasks, Double patterning technology, Optical proximity correction, SRAF

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Lithography, Deep ultraviolet, Etching, Manufacturing, Printing, Photomasks, Extreme ultraviolet, Double patterning technology, Optical proximity correction, Model-based design

PROCEEDINGS ARTICLE | February 20, 2017
Proc. SPIE. 10112, Photonic and Phononic Properties of Engineered Nanostructures VII
KEYWORDS: Plasmonics, Refractive index, Nanoparticles, Optical tweezers, Nanolithography, Light, Motion controllers, Diffraction gratings

PROCEEDINGS ARTICLE | March 16, 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Etching, Metals, Dielectrics, Manufacturing, Image quality, Bridges, Design for manufacturing, Photomasks, Double patterning technology, Optical proximity correction, SRAF, Tolerancing, Overlay metrology, Design for manufacturability

Showing 5 of 9 publications
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