Plasmonic grating structures can be used in many applications such as nanolithography and optical trapping. In this paper, we used plasmonic grating as optical tweezers to trap and manipulate dielectric nano-particles. Different plasmonic grating structures with single, double, and triple slits have been investigated and analyzed. The three configurations are optimized and compared to find the best candidate to trap and manipulate nanoparticles. The three optimized structures results in capability to super focusing and beaming the light effectively beyond the diffraction limit. A high transverse gradient optical force is obtained using the triple slit configuration that managed to significantly enhance the field and its gradient. Therefore, it has been chosen as an efficient optical tweezers. This structure managed to trap sub10nm particles efficiently. The resultant 50KT potential well traps the nano particles stably. The proposed structure is used also to manipulate the nano-particles by simply changing the angle of the incident light. We managed to control the movement of nano particle over an area of (5μm x 5μm) precisely. The proposed structure has the advantage of trapping and manipulating the particles outside the structure (not inside the structure such as the most proposed optical tweezers). As a result, it can be used in many applications such as drug delivery and biomedical analysis.
Self-Aligned-Double-Patterning (SADP) is a potential technology for metal layers in N10 and beyond nodes. SADP manufacturing process comes with lots of challenges. Several approaches were introduced to manufacture SADP. The most major SADP manufacturing approach is the Spacer-Is-Dielectric (SID). One of the main advantages of SADP over Litho-Etch-Litho-Etch (LELE) Double Patterning (DP) is better Mask Overlay Control. In addition, SADP results in better process tolerance and lower Line-Width Roughness. In this paper, we propose a model-based manufacturing flow for SID-SADP approach. The flow includes: (1) SADP Patterns Decomposition, (2) Etch Retargeting, (3) Sub Resolution Assist Features (SRAF) Insertion, (4) Optical Proximity Correction (OPC) process, and finally (5) Verification. The motivation beyond developing this flow is to find the least number of needed masks to achieve satisfactory imaging quality, and to characterize possible challenges in each step of the flow. Consequently, we highlight the challenges and the proposed techniques we examined to meet this objective.
Efficient, easy and accurate tuning techniques to a plasmonic nano-filter are investigated. The proposed filter supports both blue and red shift in the resonance wavelength. By varying the refractive index with a very small change (in the order of 10-3), the resonance wavelength can be controlled efficiently. Using Pockels material, an electrical tuning to the response of the filter is demonstrated. In addition, the behavior of the proposed filter can be controlled optically using Kerr material. A new approach of multi-stage electro-optic controlling is introduced. By cascading two stages and filling the first stage with pockels material and the second stage with kerr material, the output response of the second stage can be controlled by controlling the output response of the first stage electrically. Due to the sharp response of the proposed filter, 60nm shift in the resonance wavelength per 10 voltages is achieved. This nano-filter has compact size, low loss, sharp response and wide range of tunabilty which is highly demandable in many biological and sensing applications.
An analytical model to the modal characteristics of Metal-Insulator-Metal (MIM) plasmonic waveguide is
proposed. An expression to the propagation constant and losses as function in the refractive index, the
waveguide width, and the wavelength is obtained and verified using finite difference based mode-solver. These
expressions are used to develop a theoretical model to the behavior of a plasmonic nano-filter based MIM
configuration. The proposed model shows a good agreement with FDTD simulations. Using this model, the
sensitivity of the filter to different design parameters is investigated and analyzed analytically. Therefore, the
optimum values of different design parameters can be obtained analytically. By using this theoretical model, a
sharp resonance filter with narrow bandwidth, compact size, low loss, and good sensing characteristics can be
demonstrated. The proposed filter can be used in different applications such as, biological sensing and
A sharp resonance, narrow bandwidth plasmonic cascaded nanofilter is proposed. The resonator is based on Metal-
Insulator-Metal (MIM) plasmonic waveguide which has the ability to confine light at sub-wavelength scale. The
proposed inline resonator features low loss, compact size, and good sensing characteristics which opens the door for
many nanophotonic applications. This structure can be used in many applications such as sensing, biomedical
diagnostics and on-chip optical interconnects. For example, it can be used as a highly effective integrated sensor with
sensitivity up to 3000 nm RIU-1.