Dr. Reiner Garreis
Senior Principal Product Strategy Concepts at Carl Zeiss SMT GmbH
SPIE Involvement:
Conference Program Committee | Author
Publications (13)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Optical lithography, Imaging systems, Sensors, Inspection, Electron microscopes, Scanning electron microscopy, Image quality, Critical dimension metrology, Defect inspection

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Diffraction, Reticles, Reflectivity, Image quality, Projection systems, Photomasks, Extreme ultraviolet, Semiconducting wafers, Binary data, Image quality standards

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Diffraction, Reticles, Reflectivity, Image quality, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Semiconducting wafers

SPIE Journal Paper | October 1, 2009
JM3 Vol. 8 Issue 04
KEYWORDS: EUV optics, Extreme ultraviolet, Stray light, Critical dimension metrology, Nanoimprint lithography, Fiber optic illuminators, Photomasks, Optics manufacturing, Printing, Optical proximity correction

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Image processing, Solids, Extreme ultraviolet, Optical proximity correction, Nanoimprint lithography, Critical dimension metrology, Optics manufacturing, EUV optics, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Mirrors, Optical design, Reticles, Polarization, Water, Coating, Lens design, Chemical elements, Stray light, Combined lens-mirror systems

Showing 5 of 13 publications
Conference Committee Involvement (1)
SPIE Lithography Asia - Korea
13 October 2010 | n/a, Republic of Korea
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