Dr. Reiner Garreis
Senior Principal Head of Systems Engineering at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 28 March 2017 Presentation + Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Optical lithography, Imaging systems, Sensors, Inspection, Electron microscopes, Scanning electron microscopy, Image quality, Critical dimension metrology, Defect inspection

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Diffraction, Reticles, Reflectivity, Image quality, Projection systems, Photomasks, Extreme ultraviolet, Semiconducting wafers, Binary data, Image quality standards

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Diffraction, Reticles, Reflectivity, Image quality, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Semiconducting wafers

SPIE Journal Paper | 1 October 2009
JM3 Vol. 8 Issue 04
KEYWORDS: EUV optics, Extreme ultraviolet, Stray light, Critical dimension metrology, Nanoimprint lithography, Fiber optic illuminators, Photomasks, Optics manufacturing, Printing, Optical proximity correction

Proceedings Article | 18 March 2009 Paper
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Image processing, Solids, Extreme ultraviolet, Optical proximity correction, Nanoimprint lithography, Critical dimension metrology, Optics manufacturing, EUV optics, Fiber optic illuminators

Showing 5 of 13 publications
Conference Committee Involvement (1)
SPIE Lithography Asia - Korea
13 October 2010 | n/a, Republic of Korea
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