Dr. Reiner M. Jungblut
at ASML Taiwan Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 20 April 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Lithography, Metrology, Data modeling, Scanners, Control systems, Scatterometry, Finite element methods, Feedback control, Semiconducting wafers, Overlay metrology

Proceedings Article | 14 December 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Metrology, Scanners, Scanning electron microscopy, Scatterometry, Time metrology, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Systems modeling

Proceedings Article | 12 December 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Reticles, Diffractive optical elements, Etching, Scanners, Error analysis, Photomasks, Double patterning technology, Source mask optimization

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Reticles, Metrology, Scanners, Scatterometry, Time metrology, Optical proximity correction, Semiconducting wafers, Scatter measurement, Systems modeling

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