Dr. Reinhard R. Galler
Managing Director at EQUIcon Software GmbH Jena
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Point spread functions, Etching, Silicon, Resistance, Photomasks, Line width roughness, Cadmium sulfide, Semiconducting wafers, Resolution enhancement technologies, Chemically amplified resists

PROCEEDINGS ARTICLE | April 17, 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Target detection, Electron beam lithography, Electron beams, Cadmium, Sensors, Calibration, Scanning electron microscopy, Photomasks, Critical dimension metrology, Photoresist processing

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Point spread functions, Scattering, Calibration, Monte Carlo methods, Cadmium sulfide, Critical dimension metrology, Photoresist processing

SPIE Journal Paper | October 1, 2011
JM3 Vol. 10 Issue 04
KEYWORDS: Cadmium, Semiconducting wafers, Computer simulations, Electron beams, Detection and tracking algorithms, Electron beam lithography, Point spread functions, Model-based design, Modulation, Nanoelectronics

PROCEEDINGS ARTICLE | April 4, 2011
Proc. SPIE. 7970, Alternative Lithographic Technologies III
KEYWORDS: Electron beam lithography, Point spread functions, Electron beams, Detection and tracking algorithms, Modulation, Computer simulations, Cadmium sulfide, Electron beam direct write lithography, Semiconducting wafers, Nanoelectronics

PROCEEDINGS ARTICLE | April 2, 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Lithography, Electron beam lithography, Cadmium, Modulation, Backscatter, Scattering, Cadmium sulfide, Line edge roughness, Photoresist processing, Chemically amplified resists

Showing 5 of 10 publications
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