Rémy Charavel
PhD Student at Univ Catholique de Louvain
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | January 19, 2005
Proc. SPIE. 5592, Nanofabrication: Technologies, Devices, and Applications
KEYWORDS: Oxides, Etching, Crystals, Silicon, Doping, Photomasks, Boron, Transistors, Reactive ion etching, Semiconducting wafers

PROCEEDINGS ARTICLE | April 24, 2003
Proc. SPIE. 5116, Smart Sensors, Actuators, and MEMS
KEYWORDS: Oxides, Etching, Annealing, Silicon, Surface roughness, Silicon films, Plasma enhanced chemical vapor deposition, Semiconducting wafers, Wafer bonding, Chemical mechanical planarization

PROCEEDINGS ARTICLE | April 24, 2003
Proc. SPIE. 5116, Smart Sensors, Actuators, and MEMS
KEYWORDS: Microelectromechanical systems, Oxides, Etching, Silicon, Surface roughness, Doping, Photomasks, Aluminum, Boron, Low pressure chemical vapor deposition

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