Dr. Ren-Jay Kou
at ASML Taiwan Ltd
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | December 12, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Reticles, Diffractive optical elements, Etching, Scanners, Error analysis, Photomasks, Double patterning technology, Source mask optimization

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Reticles, Metrology, Scanners, Scatterometry, Time metrology, Optical proximity correction, Semiconducting wafers, Scatter measurement, Systems modeling

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