Rene M. Blanquies
Research and Development Engineer at VLSI Standards Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 24 May 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Oxides, Polishing, Calibration, Etching, Silicon, Transmission electron microscopy, Line width roughness, Critical dimension metrology, Line edge roughness, Semiconducting wafers

Proceedings Article | 2 June 2000
Proc. SPIE. 3998, Metrology, Inspection, and Process Control for Microlithography XIV
KEYWORDS: Lithography, Reticles, Metrology, Data modeling, Databases, Error analysis, Process control, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 3 February 2000
Proc. SPIE. 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Reticles, Pattern recognition, Optical testing, Scanning electron microscopy, LCDs, Inspection equipment, Very large scale integration, Photomasks, Critical dimension metrology, Defect inspection

Proceedings Article | 30 December 1999
Proc. SPIE. 3873, 19th Annual Symposium on Photomask Technology
KEYWORDS: Reticles, Calibration, Pattern recognition, Inspection, Optical testing, Scanning electron microscopy, LCDs, Inspection equipment, Photomasks, Defect inspection

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