Reuven Falah
at Applied Materials Ltd
SPIE Involvement:
Publications (13)

Proceedings Article | 5 April 2007 Paper
Thomas Marschner, Maik Enger, Frank Ludewig, Reuven Falah, Sergey Latinsky, Ofer Lindman, Thomas Coleman
Proceedings Volume 6518, 65181W (2007)
KEYWORDS: Computer aided design, Scanning electron microscopy, Photomasks, Metrology, Reticles, Pattern recognition, Binary data, Solid modeling, Semiconducting wafers, Target recognition

Proceedings Article | 5 April 2007 Paper
Thomas Marschner, Jan Richter, Uwe Dersch, Amit Moran, Ruthy Katz, David Chase, Reuven Falah, Thomas Coleman
Proceedings Volume 6518, 65181R (2007)
KEYWORDS: Photomasks, Line edge roughness, Computer aided design, Metrology, Signal processing, Critical dimension metrology, Line width roughness, Semiconducting wafers, Edge roughness, Scanning electron microscopy

Proceedings Article | 9 November 2005 Paper
D. Chase, R. Kris, R. Katz, A. Tam, L. Gershtein, R. Falah, N. Wertsman
Proceedings Volume 5992, 59924N (2005)
KEYWORDS: Photomasks, Metrology, Edge roughness, Manufacturing, Reticles, Critical dimension metrology, Scanning electron microscopy, Integrated circuits, Line edge roughness, Photomask technology

Proceedings Article | 17 December 2003 Paper
Shirley Hemar, Reuven Falah, Anja Rosenbusch, Yuval Blumberg
Proceedings Volume 5256, (2003)
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Reticles, Optical proximity correction, Critical dimension metrology, Lithography, Defect detection, Image enhancement, Printing

Proceedings Article | 28 August 2003 Paper
Proceedings Volume 5130, (2003)
KEYWORDS: Inspection, Optical proximity correction, Heads up displays, Lithium, Imaging systems, Airborne remote sensing

Showing 5 of 13 publications
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