Dr. Cheng-En R. Wu
at Synopsys Taiwan Co Ltd
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | October 8, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Optical lithography, Data modeling, 3D modeling, Photoresist materials, Photomasks, Optical proximity correction, Photoresist processing, Semiconducting wafers, Photoresist developing

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Data modeling, Reflection, Etching, Ions, 3D modeling, Monte Carlo methods, Plasma etching, Critical dimension metrology, Plasma, Anisotropy

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Data modeling, Physics, Photoresist materials, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Photoresist developing, Reverse modeling

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Lithographic illumination, Data modeling, Calibration, Etching, Diffusion, 3D modeling, Optical proximity correction, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | September 16, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Atrial fibrillation, Data modeling, Calibration, Etching, Diffusion, 3D modeling, Printing, Photoresist materials, Optical proximity correction, Semiconducting wafers

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