Dr. Richard A. Farrell
SPIE Involvement:
Conference Program Committee | Author
Publications (23)

SPIE Journal Paper | July 31, 2018
JM3 Vol. 18 Issue 01
KEYWORDS: Etching, Extreme ultraviolet, Line edge roughness, Optical lithography, Line width roughness, Silicon, Double patterning technology, Dielectrics, Metals, System on a chip

PROCEEDINGS ARTICLE | April 9, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Polishing, Optical lithography, Silica, Etching, Transmission electron microscopy, Plasma etching, Critical dimension metrology, Plasma, Chemical mechanical planarization

PROCEEDINGS ARTICLE | April 6, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Silicon, Scanning electron microscopy, Atomic layer deposition, Photomasks, Transistors, Plasma etching

PROCEEDINGS ARTICLE | April 4, 2018
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Optical lithography, Etching, Metals, Image processing, Dielectrics, Silicon, Extreme ultraviolet, Line width roughness, Double patterning technology, Line edge roughness

PROCEEDINGS ARTICLE | March 28, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Oxides, Lithography, Etching, Metals, Dielectrics, Scanning electron microscopy, Directed self assembly, Critical dimension metrology, Tin, Back end of line

SPIE Journal Paper | August 28, 2017
JM3 Vol. 16 Issue 03
KEYWORDS: Oxides, Polymers, Extreme ultraviolet, Optical lithography, Head-mounted displays, Etching, Atomic layer deposition, Chemistry, Plasma enhanced chemical vapor deposition, Printing

Showing 5 of 23 publications
Conference Committee Involvement (2)
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2019
25 February 2019 | San Jose, California, United States
Novel Patterning Technologies 2018
26 February 2018 | San Jose, California, United States
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