Richard Gladhill
Senior Automation Engineer at Toppan Photomasks Inc
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 3 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Electron beams, Data modeling, Databases, Image segmentation, Manufacturing, Printing, Photomasks, Raster graphics, Computer aided design

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Wafer-level optics, Lithography, Image processing, Manufacturing, Data processing, Process control, Photomasks, Optical proximity correction, Semiconducting wafers, Electronic design automation

Proceedings Article | 21 March 2007
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Lithography, Metals, Manufacturing, Inspection, Design for manufacturing, Photomasks, Semiconducting wafers, Lawrencium, Chemical mechanical planarization, Design for manufacturability

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Reticles, Visualization, Manufacturing, Inspection, Design for manufacturing, Photomasks, Optical proximity correction, Electronic design automation, Defect inspection

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Electron beam lithography, Manufacturing, Control systems, Photomasks, Beam shaping, Optical proximity correction, Critical dimension metrology, Electronic design automation, Vestigial sideband modulation

Showing 5 of 8 publications
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